发明名称 SUBSTRATE TREATING DEVICE, AND SUBSTRATE TREATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate treating device capable of easily and speedily separating a substrate from a support plate without breaking the substrate. SOLUTION: The substrate treating device 10 includes a gas supply means 11 and a substrate holding means 12. The gas supply means 11 has a gas supply hole 11a penetrating it along the thickness, and supplies gas to an adhesive layer 3 bonding the substrate 1 and support plate 2 through the gas supply hole 11a. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009059776(A) 申请公布日期 2009.03.19
申请号 JP20070224020 申请日期 2007.08.30
申请人 TOKYO OHKA KOGYO CO LTD 发明人 NAKAMURA AKIHIKO
分类号 H01L21/304 主分类号 H01L21/304
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