METHOD OF DATA ENCODING, COMPRESSION, AND TRANSMISSION ENABLING MASKLESS LITHOGRAPHY
摘要
A method and tool for conducting charged-particle beam direct write lithography is disclosed. A disclosed method involves condensing an initial design file down to a set of profiles and a pattern of relative locations to form a formatted pattern file. The formatted pattern file is adjusted to accommodate desired pattern corrections. Portions of the formatted pattern records are extracted to form data strips that have a plurality of channels with a pattern of profiles and spatial indicators. Data strips are sequentially read to construct a printable pattern of profiles and spatial indicators that specify the locations of the profiles. Additionally, the pattern of profiles are sequentially printed from each data strip onto a substrate to form the desired pattern on the substrate.
申请公布号
WO2008052080(A3)
申请公布日期
2009.03.19
申请号
WO2007US82433
申请日期
2007.10.24
申请人
KLA-TENCOR TECHNOLOGIES CORPORATION;LORDI, VINCENZO;LEVI, SHEM-TOV;HESS, HARALD