| 摘要 |
PROBLEM TO BE SOLVED: To improve efficiency of a process and minimize an amount of adsorption of a fluorine atom onto a surface of a processed substrate in a dry cleaning process for removing a native oxide film. SOLUTION: While a fluorine radical is supplied onto a surface of a substrate to be processed, a hydrogen radical is supplied. The surface of the substrate to be processed is processed through a reaction between the fluorine radical and hydrogen radical. COPYRIGHT: (C)2009,JPO&INPIT
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