BASE MATERIAL FOR POLISHING OR WIPING

摘要

A polishing base material (10) comprises a flexible base material (20), a cushion layer (30) formed on one side of the flexible base material (20) and made of a material more elastic than the flexible base material (20), and a nano fiber layer (40) formed on the cushion layer (30). By using the polishing base material (10), texture processing for a magnetic recording medium can be carried out with a polishing material finer than the conventional ones, while ensuring mechanical strength sufficient as a polishing base material. Consequently, texture processing for a magnetic recording medium can be carried out with higher precision than before. When the polishing base material (10) is employed as a base material for wiping, film cleaning or varnishing for a magnetic recording medium can be carried out with higher precision than before.