EXPOSURE SYSTEM AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

摘要

An exposure system and a manufacturing method of a semiconductor device are provided to perform an exposure processing at each substrate with an optimized focus by calculating a best focus position by one exposure. A space image mark body(4) is arranged between an exposure light source and a projection lens(5). A plurality of space image marks is arranged on the space image mark body. A main surface of a space image projection plate(6) is tilted about a substrate loading surface of a wafer stage. An image of a plurality of space image marks is projected to the space image projection plate through the projection lens. A detector detects a light intensity of a projected image of each space image mark.