| 摘要 |
PROBLEM TO BE SOLVED: To improve a particle removing rate, in a substrate cleaning method and a substrate cleaning device using technology for freezing a liquid film made to adhere to a substrate. SOLUTION: A SC1 solution (mixed solution containing aqueous ammonia and hydrogen peroxide solution) is supplied to the substrate surface Wf to form the liquid film 11 composed of the SC1 solution on the substrate surface Wf. A frozen film 13 is then formed on the substrate surface Wf by freezing the liquid film 11. After this, the SC1 solution is supplied toward the substrate surface Wf to remove the frozen film 13 from the substrate surface Wf. In this way, while always removing particles effectively by the SC1 solution, they are effectively removed also by volume expansion when the liquid film 11 is frozen, therefore, the particles can be effectively removed from the substrate W. COPYRIGHT: (C)2009,JPO&INPIT
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