发明名称 VAPOR DEPOSITION APPARATUS FOR AN ORGANIC VAPOR DEPOSITION MATERIAL AND A METHOD FOR PRODUCING AN ORGANIC FILM
摘要 A vapor deposition apparatus is provided, which does not cause changes in composition, decomposition and quality change of an organic vapor deposition material. The organic vapor deposition material is placed on a conveying unit by an amount for a single substrate, and conveyed into a vapor deposition vessel preliminarily heated. Since a small amount of the organic vapor deposition material is heated and exhausted through generation of an organic material vapor under heating condition for each substrate, neither decomposition nor quality change with moisture occurs because heating time is short. Even though different organic compounds are mixed, no change in composition occurs so that an organic vapor deposition material in which a base material is mixed with a coloring substance can be pooled in a pooling tank and then placed in the conveying unit.
申请公布号 US2009061090(A1) 申请公布日期 2009.03.05
申请号 US20080212030 申请日期 2008.09.17
申请人 ULVAC, INC. 发明人 NEGISHI TOSHIO
分类号 C23C16/44;C23C16/54 主分类号 C23C16/44
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