DESIGN AND FABRICATION METHOD OF THIN FILM SOLID OXIDE FUEL CELLS

摘要

A silicon-based solid oxide fuel cell (SOFC) with high surface area density in a limited volume is provided. The structure consists of a corrugated nano-thin film electrolyte and a silicon supportive layer on a two-stage silicon wafer through-hole to maximize the electrochemically active surface area within a given volume. The silicon supportive layer is done by boron-etch stop technique with diffusion doping. The fabrication of two-stage wafer through hole combines deep reactive ionic etching (DRIE) and KOH wet etching of silicon for a wafer through hole containing two difference sizes. By these design and fabrication methods, the absolute electrochemically active area can be as high as five times of that of the projected area.