摘要 |
<p>The method involves providing a radiation source (10) e.g. laser, and a radiation sensor (30) at a distance in a measuring site (B). An object associated with a pattern-making body (20) is positioned between the source and the sensor, and a radiation beam (11) is directed to the sensor, where diffraction of the radiation causes an interference pattern (31) on the sensor. A relative displacement of the pattern is measured relative to the sensor, and the movement of the object relative to an optical axis is calculated from the measured displacement of the interference pattern. Independent claims are also included for the following: (1) a device for measuring a displacement of an object relative to a reference (2) a kit for a device for measuring a displacement of an object relative to a reference.</p> |