发明名称 Object displacement measuring device for seismograph application, involves calculating movement of object relative to optical axis from measured displacement of interference pattern
摘要 <p>The method involves providing a radiation source (10) e.g. laser, and a radiation sensor (30) at a distance in a measuring site (B). An object associated with a pattern-making body (20) is positioned between the source and the sensor, and a radiation beam (11) is directed to the sensor, where diffraction of the radiation causes an interference pattern (31) on the sensor. A relative displacement of the pattern is measured relative to the sensor, and the movement of the object relative to an optical axis is calculated from the measured displacement of the interference pattern. Independent claims are also included for the following: (1) a device for measuring a displacement of an object relative to a reference (2) a kit for a device for measuring a displacement of an object relative to a reference.</p>
申请公布号 NL1034328(C2) 申请公布日期 2009.03.05
申请号 NL20071034328 申请日期 2007.09.04
申请人 STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE 发明人 HENDRIK VAN DER GRAAF
分类号 G01B11/16;G01B11/27 主分类号 G01B11/16
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