METHOD AND DEVICE FOR ARRANGING DUMMY PATTERN, PROGRAM, AND SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To solve the problem wherein a load of OPC process (especially a load of bias process) increases under the optical effect following arrangement of a dummy pattern.

SOLUTION: A pattern arranging device 50 arranges a dummy pattern in a layout region where a plurality of wiring patterns are arranged. The pattern arranging device 50 is provided with: an arrangement region setting part 54 which sets the arrangement region where a dummy pattern is arranged in an intermediate region between the wiring patterns adjoining each other in such a way that distances from both adjoining wiring patterns are substantially constant; and a pattern arranging part 55 for arranging the dummy pattern in the arrangement region.

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