SEMICONDUCTOR MANUFACTURING APPARATUS, VALVE DEVICE, CVD TREATMENT METHOD USING VALVE DEVICE, AND MANUFACTURING METHOD OF SEMICONDUCTOR

摘要

PROBLEM TO BE SOLVED: To significantly reduce burden in cleaning by preventing a solid film from being formed on a flow passage wall surface, and improve an operating rate of a semiconductor manufacturing apparatus. SOLUTION: The semiconductor manufacturing apparatus includes the valve device having a fixed part such as a valve box 2, and a movable part such as a valve body 9 arranged between a reaction chamber and an exhaust pump. A heater 31 for heating and maintaining the fixed part adjacent to a gas flow passage at higher than a coagulation temperature of a coagulated part contained in gas exhausted from the reaction chamber is provided on the fixed part of the valve device. COPYRIGHT: (C)2009,JPO&INPIT