| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition system and a film deposition method for depositing a film having high crystallinity. SOLUTION: The film deposition system 10 has a magnetic circuit 30 arranged at the first face side of a target 22 and an object 5 for film deposition arranged at the second face side of the target 22, and performs film deposition by a magnetron sputtering process, wherein the magnetic circuit 30 is provided with: a center magnet 31; and outer circumferential magnets 32 arranged so as to surround the center magnet 32. The magnetic circuit 30 generates a magnetic field in which the absolute value of a perpendicular magnetic field in the surface of the object 5 for film deposition reaches≥10 gauss within the width of the magnetic circuit 30. COPYRIGHT: (C)2009,JPO&INPIT
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