发明名称 SILICA GLASS FOR PHOTOCATALYST AND ITS PRODUCTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide silica glass for a photocatalyst, which is used for a photocatalytic reaction unit and excels in ultraviolet-ray resistance etc., is hardly deteriorated with respect to the properties even when irradiated with ultraviolet rays for a long time; and to provide its production method. SOLUTION: In silica glass. the above-described silica glass satisfies at least the followings: having 1-500 wt.ppm OH group content; substantially free of an oxygen defect structure; and having at least 200 wt. ppb metal impurity concentration for each of Li, Na, K, Mg, Ca, Cr, Fe, Ni, Cu and Zn throughout a region from the surface layer part to the inside. Whereby the silica glass for a photocatalyst is applicable to the photocatalytic reaction unit. The production method for the silica glass is also provided. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009046328(A) 申请公布日期 2009.03.05
申请号 JP20070211695 申请日期 2007.08.15
申请人 SHINETSU QUARTZ PROD CO LTD 发明人 YAMAGATA SHIGERU;FUEFUKI TOMOMI
分类号 C03B20/00;B01J21/08;B01J35/02;C03B8/04 主分类号 C03B20/00
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