| 发明名称 |
Cathode liner with wafer edge gas injection in a plasma reactor chamber |
| 摘要 |
The disclosure concerns a wafer support for use in a plasma reactor chamber, in which the wafer support has a wafer edge gas injector adjacent and surrounding the wafer edge.
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| 申请公布号 |
US2009056629(A1) |
申请公布日期 |
2009.03.05 |
| 申请号 |
US20070899614 |
申请日期 |
2007.09.05 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
KATZ DAN;PALAGASHVILI DAVID;WILLWERTH MICHAEL D.;TODOROW VALENTIN N.;PATERSON ALEXANDER M. |
| 分类号 |
C23C16/513 |
主分类号 |
C23C16/513 |
| 代理机构 |
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代理人 |
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| 主权项 |
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