| 摘要 |
A method of manufacturing the semiconductor device is provided to remove the rinse liquid in the medical fluid cleaning with the chemical solution in a short time and to improve the regeneration rate of the chemical solution. The controller(121) performs the liquid agent processing by the chemical solution after rinsing by the rinse liquid. At this time, the substrate(W) is rotated at the number of rotation which is higher than the number of rotation for rinsing. The drainage cup(51) is washed by the chemical solution. At that time, the liquid received in the drainage cup is disused by the waste line(113). Thereafter, the substrate is rotated at the number of rotation for the chemical solution processing. The chemical solution processing of substrate is performed. At that time, the chemical received in the drainage cup is collected by the return line(112).
|
