发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES HAVING HIGH-Q WAFER BACK-SIDE CAPACITORS
摘要 <p>Methods are provided for fabricating semiconductor IC (integrated circuit) chips having high-Q on-chip capacitors formed on the chip back-side and connected to integrated circuits on the chip front-side using through-wafer interconnects. In one aspect, a semiconductor device includes a semiconductor substrate having a front side, a back side, and a buried insulating layer interposed between the front and back sides of the substrate. An integrated circuit is formed on the front side of the semiconductor substrate, an integrated capacitor is formed on the back side of the semiconductor substrate, and an interconnection structure is formed through the buried insulating layer to connect the integrated capacitor to the integrated circuit.</p>
申请公布号 EP2030232(A1) 申请公布日期 2009.03.04
申请号 EP20070729380 申请日期 2007.05.22
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CLEVENGER, LAWRENCE;DALTON, TIMOTHY, JOSEPH;HSU, LOUIS, LU-CHEN;RADENS, CARL, JOHN;RAMACHANDRAN, VIDHYA;WONG,KEITH, KWONG HON;YANG, CHIH-CHAO
分类号 H01L21/8242;H01L27/12 主分类号 H01L21/8242
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