发明名称 WET CLEAN PROCESS FOR RECOVERY OF ANODIZED CHAMBER PARTS
摘要 A wet clean process for recovery of anodized chamber parts is provided to re-polish the chamber component having non-solved remnant by using a plasma process. The anodized aluminum part is put within solvent(86). The fluoric acid like aluminum fluoride is mixed within solvent. The aluminum fluoride is transformed to the soluble fluoro. The anodized aluminum part is rinsed in the water(88). The anodized aluminum part is dipped within the mixed deionized water of the high temperature. The washed pores of the anodization is released(90).
申请公布号 KR20090023167(A) 申请公布日期 2009.03.04
申请号 KR20080083318 申请日期 2008.08.26
申请人 APPLIED MATERIALS INC. 发明人 SUN JENNIFER Y.;THACH SENH;ZHU XI;XU LI;KHAN ANISUL
分类号 H01L21/302 主分类号 H01L21/302
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