发明名称 METHOD FOR FORMING MASK PATTERN
摘要 <p><P>PROBLEM TO BE SOLVED: To provide techniques for improving the extraction efficiency of repeated patterns in a method for forming a mask pattern. <P>SOLUTION: For example, cell patterns (A) having the same pattern are extracted from layout data. The extracted cell patterns (A) are classified, for example, into cell patterns A1 to A5 according to differences in adjoining patterns. Then the cell patterns A<SB>1</SB>to A<SB>5</SB>are classified by a cell group classification section 3. For example, cell patterns A<SB>1</SB>to A<SB>3</SB>are classified into the same cell group, while cell patterns A<SB>4</SB>to A<SB>5</SB>are classified to the same another cell group. Consecutively, OPC is carried out in the classified two cell groups OPC by an OPC standardizing section 5. For example, in the cell group including the cell patterns A<SB>1</SB>to A<SB>3</SB>, common OPC is carried out in each of the cell patterns A<SB>1</SB>to A<SB>3</SB>. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009020393(A) 申请公布日期 2009.01.29
申请号 JP20070184117 申请日期 2007.07.13
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 NOZATO HIROKAZU;SAKANASHI HIDENORI;MURAKAWA MASAHIRO;HIGUCHI TETSUYA
分类号 G03F1/36 主分类号 G03F1/36
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