发明名称 METHOD FOR CORRECTING DEFECT IN GRAY TONE MASK, METHOD FOR MANUFACTURING GRAY TONE MASK, GRAY TONE MASK, AND METHOD FOR TRANSFERRING PATTERN
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for correcting a defect in a gray tone mask, by which a defect caused in a semi-translucent part can be suitably corrected. <P>SOLUTION: The method for correcting the defect in a gray tone mask 20 having a light-shielding part 21, a translucent part 22 and a semi-translucent part 23 where the transmission amount of exposure light to be used when using the mask can be decreased by a predetermined amount, includes: a step in which the semi-translucent part 23 is formed of a semi-translucent film 26 and a defective region is specified in the semi-translucent part 23; and a step of forming a correction film 27 having a different composition from that of the semi-translucent film in the defective region. In the step of forming a correction film, light transmittance characteristics of the correction film with respect to the exposure light at a predetermined wavelength are preliminarily recognized; and on the basis of the recognized light transmittance characteristics of the correction film, such conditions are applied that the light transmittance of the correction film 27 with respect to the exposure light at the predetermined wavelength is approximately equal to that of the semi-translucent film 26. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009020312(A) 申请公布日期 2009.01.29
申请号 JP20070182870 申请日期 2007.07.12
申请人 HOYA CORP 发明人 TANAKA JUNICHI;SANO MICHIAKI
分类号 G03F1/72;G03F1/74 主分类号 G03F1/72
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