| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus which can measure a plurality of optical characteristics including wave front aberration, effective light source distribution and diffraction light distribution while avoiding degradation of a stage performance or enlargement of a stage size. <P>SOLUTION: The exposure apparatus includes an illuminating optical system for illuminating a reticle with a light flux from a light source, a projection optical system for projecting a pattern of the reticle onto a substrate supported on a stage, and a measuring section. The measuring section includes a measuring substrate located on the stage and having a plurality of opening patterns having different surface areas for the light flux from the projection optical system to pass therethrough, and a photoelectric conversion sensor located on the state for receiving the light flux from the plurality of opening patterns. At least one of the effective light source distribution formed by the illuminating optical system, the diffraction light distribution generated by the reticle pattern, and a pupil transmittance distribution of the projection optical system is found on the basis of an output from the photoelectric conversion sensor. <P>COPYRIGHT: (C)2009,JPO&INPIT |
