发明名称 |
METHOD FOR REMOVING CONTAMINATION WITH FLUORINATED COMPOSITIONS |
摘要 |
<p>A method of removing contamination from a substrate having an ion-implanted region is described. The method comprises applying a composition comprising a fluorinated solvent and a co-solvent to the substrate in an amount sufficient to assist in the removal of contamination from the substrate. As contaminant is removed, metal patterns or other desired features on the substrate remain. Additionally, the composition for removing contamination is not harmful to the user or the substrate (i.e., non-flammable and/or non caustic).</p> |
申请公布号 |
WO2009014791(A1) |
申请公布日期 |
2009.01.29 |
申请号 |
WO2008US62725 |
申请日期 |
2008.05.06 |
申请人 |
3M INNOVATIVE PROPERTIES COMPANY |
发明人 |
OLSON, ERIK D.;CLARK, PHILIP G. |
分类号 |
H01L21/306 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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