发明名称 |
TEXTURED-GRAIN-POWDER METALLURGY TANTALUM SPUTTER TARGET |
摘要 |
The sputter target includes a tantalum body having tantalum grains formed from consolidating tantalum powder and a sputter face. The sputter face has an atom transport direction for transporting tantalum atoms away from the sputter face for coating a substrate. The tantalum grains have at least a 40 percent ( 222 ) direction orientation ratio and less than a 15 percent ( 110 ) direction orientation ratio in an atom transport direction away from the sputter face for increasing sputtering uniformity, the tantalum body being free of ( 200 )-( 222 ) direction banding detectable by Electron Back-Scattering Diffraction and wherein the sputter target has a purity of at least 99.99 (%) percent. |
申请公布号 |
EP1735476(A4) |
申请公布日期 |
2009.01.28 |
申请号 |
EP20050725958 |
申请日期 |
2005.03.21 |
申请人 |
PRAXAIR S.T. TECHNOLOGY, INC. |
发明人 |
KOENIGSMANN, HOLGER, J.;GILMAN, PAUL, S. |
分类号 |
C22C27/02;C22C1/04;C23C14/34;H01L21/285 |
主分类号 |
C22C27/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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