| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate development method and a developing apparatus that can hold down an amount of development liquid used and suitably develop a substrate. SOLUTION: A developing apparatus comprises a spin chuck and a motor which hold a substrate so as to be able to rotate, a developer supply nozzle which supplies the developer to the substrate, a controlling part that conducts an overall control and the like. The controlling part rotates the substrate where the developer is supplied to make the film thickness of the developer supplied on the substrate thinner than that of the developer in a normal state of dripped liquid, and maintains the developer in a thin film state to be in almost the same size as that of the substrate (process of maintaining the thin film). For this reason, the substrate can be suitably developed while the amount of developer used can be kept low. COPYRIGHT: (C)2009,JPO&INPIT |
