| 摘要 |
According to one embodiment, an electron beam drawing method includes placing a substrate, on which a photosensitive resin film is coated, on a stage, applying an electron beam to the photosensitive resin film while the substrate on the stage is rotated and moved to the horizontal direction, and drawing a pattern extending to a radial direction, in which the electron beam is deflected to a direction parallel with a rotational direction of the substrate such that a relative movement speed of an electron-beam applied position on the substrate in the direction parallel with the rotational direction of the substrate becomes slower than a linear velocity of the substrate, viewed from a drawing start position in a circulation for drawing the pattern. |
