APPARATUS AND METHOD FOR MEASURING PATTERN PITCH AND APPARATUS AND METHOD FOR INSPECTING SURFACE

摘要

A pitch measuring apparatus for measuring the pitch of an L/S pattern (12) is provided with irradiation systems (1-3) for irradiating a pattern with light by switching at least two wavelengths; detection systems (4, 5) for detecting 0-order diffracted light reflected by the pattern; and a measurement system (6) for measuring a pattern pitch based on the intensity ratio of the intensity of the 0-order diffracted light detected with the first wavelength to the intensity of the 0-order diffracted light detected with the second wavelength by the detection systems.