发明名称 TECHNIQUE FOR MONITORING AND CONTROLLING A PLASMA PROCESS
摘要 A time-of-flight ion sensor for monitoring ion species in a plasma includes a housing. A drift tube is positioned in the housing. An extractor electrode is positioned in the housing at a first end of the drift tube so as to attract ions from the plasma. A plurality of electrodes is positioned at a first end of the drift tube proximate to the extractor electrode. The plurality of electrodes is biased so as to cause at least a portion of the attracted ions to enter the drift tube and to drift towards a second end of the drift tube. An ion detector is positioned proximate to the second end of the drift tube. The ion detector detects arrival times associated with the at least the portion of the attracted ions. ® KIPO & WIPO 2009
申请公布号 KR20080112266(A) 申请公布日期 2008.12.24
申请号 KR20087024313 申请日期 2008.10.02
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. 发明人 KOO BON WOONG;GODET LUDOVIC;VOURLOUMIS VASSILIS PANAYOTIS;SINGH VIKRAM;FANG ZIWEI;LINDSAY BERNARD G.
分类号 H01J49/40;G01N33/00;H01J37/244 主分类号 H01J49/40
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