| 摘要 |
<p>A cleaning gas improves the etching reaction rate of cleaning gas including a fluorocarbon gas, and increases the cleaning effect. And the cleaning method uses the cleaning gas. A mixed gas of a fluorocarbon gas represented by the general formula of CvHxFyOz, wherein v is an integer from 1 to 5, x is selected from 0 and an integer from 1 to 3, y is an integer from 1 to 12, and z is selected from 0 and 1 and oxygen gas, to which is added at least one selected from the group of nitrogen trifluoride, fluorine, nitrous oxide, nitrogen, and rare gases up to 10% by volume based on the total gas volume.</p> |
