| 摘要 |
<p>A method for cleaning photomask is provided to remove foreign materials from the surface of a photomask effectively. A method for cleanning photomask comprises: a step for introducing a photomask(100) in which a mask pattern is formed on a transparent substrate(110); and a step for removing foreign materials absorbed in the photomask due to volume change by the evaporation of a liquid nitrogen, the reduction of surface tension by cooling and momentum by spraying liquid nitrogen on the photomask. A blow nozzle(230) connected to a liquid nitrogen storing tank(t210) is introduced on the photomask. The jet(250) of the liquid nitrogen is sprayed on the photomask and washes the photomask. Washing about the photomask whole-area is made by the scan movement of the nozzle.</p> |
