| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a new pattern transfer device which can perform alignment at a high speed, an imprint device, a pattern transfer method, and an alignment method. <P>SOLUTION: In the pattern transfer method, a mold having an alignment mark and a substrate having an alignment mark are provided, and an uneven pattern formed in the mold is transferred to a resin existing on the substrate or between the substrate and the mold. The method includes the first process of arranging the alignment mark of the mold and the alignment mark of the standard substrate at the first object position to be observed by the first image pick-up part to acquire the first image, the second process of arranging the alignment mark of the standard substrate at the second object position separated from the first object position to be observed by the second image pick-up part to acquire the second image, and the third process of acquiring with the use of the first and second images, information concerning the difference between the image positions by these alignment marks. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
