| 摘要 |
<P>PROBLEM TO BE SOLVED: To achieve a correction to keep a residual aberration as small as possible with excellent responsiveness over a short period of time even when a deformable mirror having a large number of electrodes applying a voltage is used in correcting a wavefront aberration. <P>SOLUTION: A wavefront aberration correction apparatus includes a deformable mirror 9 having a membrane mirror 9b which varies the shape depending on a voltage value Vn applied to the electrodes 9e in Fig.2, a wavefront sensor 14 which receives beams through a subject of the aberration correction and the deformable mirror 9 to measure the wavefront aberration, a voltage template storage means for storing a voltage template V<SB>m</SB><SP>*</SP>by a polynomial of the wavefront aberration, an electrode applying voltage operating means which determines an overlapping amplitude of each expansion mode so that the wavefront aberration obtained by the wavefront sensor 14 achieves a desired aberration and operates the voltage value Vn applied to respective electrodes 9e by the voltage template V<SB>m</SB><SP>*</SP>, and a deformable mirror control means which controls to repeat the correction of the shape of the mirror of the deformable mirror 9 in a manner to suppress the wavefront aberration of the beams measured by the wavefront sensor 14. <P>COPYRIGHT: (C)2008,JPO&INPIT |
