| 摘要 |
PROBLEM TO BE SOLVED: To prevent the clogging of a nozzle, which discharges a probe solution, with dust. SOLUTION: The dust in the probe solution supplied to a flow channel 7 from a liquid supply port 8 is captured by the barrier wall 14 and barrier wall column 15 arranged between the liquid supply port 8 and the nozzle 6. The interlaminar film 16, having an opening 16a formed by a photolithographicy technique, is provided in the communication part of the liquid supply port 8 and the flow channel 7. Even in a case that the liquid supply port 8 is expanded by the unintended etching spread when the liquid supply port 8 is formed by etching a silicon substrate 1, the size or position of the opening 16a of the interlaminar film 16 will not change, and the probe solution flows through the space between the barrier wall 14 and the barrier wall column 15. During this period, foreign matters, such as, dust can be removed. COPYRIGHT: (C)2008,JPO&INPIT |
