发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device capable of reducing on-resistance, and to provide its manufacturing method. SOLUTION: An IGBT 91 includes: a substrate S; an emitter electrode 17 formed on the upper surface Sa of the substrate S; a collector electrode 15 formed on the lower surface Sb of the substrate S; and control mechanisms (a p-type base region 7, an n<SP>+</SP>impurity region 11, an insulating film 13, and a gate electrode 19) each controlling an electric current flowing between the emitter electrode 17 and the collector electrode 15. An n<SP>-</SP>drift region 1 is formed in the substrate S. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008226997(A) 申请公布日期 2008.09.25
申请号 JP20070060525 申请日期 2007.03.09
申请人 SUMITOMO ELECTRIC IND LTD 发明人 FUJIKAWA KAZUHIRO;HOSHINO TAKASHI
分类号 H01L29/12;H01L21/28;H01L21/337;H01L29/41;H01L29/423;H01L29/49;H01L29/739;H01L29/749;H01L29/78;H01L29/808;H01L29/861 主分类号 H01L29/12
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