| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film treatment device with which a highly uniform film and high productivity can be simultaneously achieved by making the most of the excellent characteristics of a work rotating and revolving system. SOLUTION: The work is subjected to high-speed rotation and revolution by constituting a gear mechanism of causing the work to rotate and revolve to one module capable of conveying the work, thereby installing a mechanism of conveying the module from a load locking chamber to a sputtering chamber, and an outside spit for fixing a fixing stage within the module in the sputtering chamber and a rotating section for transmitting rotation drive to the rotary stage. COPYRIGHT: (C)2008,JPO&INPIT
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