| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus capable of preventing separation of a vapor deposition material from a cell shutter by preventing thick deposition of the vapor deposition material on the cell shutter. SOLUTION: A vacuum vapor deposition apparatus 100 comprises a vapor deposition source 12 having an aperture 12a for emitting a vapor flow of a vapor deposition material, a cell shutter 15 having a blocking surface 154 which covers the aperture 12a on an upper part to stop the supply of the vapor flow to a substrate 20 to be treated, and a cell shutter driving device for driving the cell shutter 15 so that the cell shutter 15 opens/closes the aperture 12a. A shutter plate 153 is formed in a hemispherical shape opened downwardly, and the blocking surface 54 is formed in a recess spherical surface recessed toward the substrate 20 side. Therefore, even when the vapor deposition material of the same volume is deposited, the thickness of a deposition layer 17 of the vapor deposition material on the blocking surface 154 is small, and the deposition layer 17 is hardly separated. COPYRIGHT: (C)2008,JPO&INPIT
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