| 摘要 |
<p>A gas flow diffuser is provided to enable compensation for conductance or other chamber attributes that cause asymmetrical processing. A vacuum processing chamber comprises a chamber body(110), a substrate support(116), a pumping port, and a gas distribution assembly. The chamber body has an interior volume(178). The substrate support is disposed in the interior volume. The pumping port is disposed below a plane of a substrate supporting surface of the substrate support, wherein a location of the pumping port and geometry of the interior volume have a configuration that produces an asymmetrical processing result on a substrate(114) disposed on the substrate supporting surface of the substrate support. The gas distribution assembly is positioned above the plane of the substrate supporting surface of the substrate support, wherein a configuration of the gas distribution assembly is selected to tune asymmetry for the processing result caused by the location of the pumping port and geometry of the interior volume.</p> |
