| 摘要 |
A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. At least one vibration isolation support device can be provided for supporting an object of the apparatus. The object can be rotatably supported at the vibration isolation support device by way of a rotational support having a center of rotation. The rotational support can have its center of rotation located substantially at the center of gravity of the vibration isolation support device.
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