发明名称 FILM FORMATION APPARATUS, MANUFACTURING APPARATUS, FILM FORMATION METHOD, AND METHOD FOR MANUFACTURING A LIGHT-EMITTING DEVICE
摘要 A film formation apparatus, a manufacturing apparatus, a film formation method, and a method for manufacturing a light emitting device are provided to form a film with high uniformity without a film thickness monitor and improve throughput by performing film formation treatment on a plurality of substrates. A method for manufacturing a light emitting device includes the steps of: forming a first organic layer(102) including organic material on a first substrate(101) having a conductive surface; arranging a second substrate(103) having a first electrode to oppose the first electrode to the first substrate; forming a second organic layer on the first electrode by applying current onto the conductive surface of the first substrate, heating the first organic layer, and evaporating the organic material of the first organic layer; and forming a second electrode on the second organic layer.
申请公布号 KR20080086349(A) 申请公布日期 2008.09.25
申请号 KR20080022489 申请日期 2008.03.11
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 IBE TAKAHIRO;IKEDA HISAO
分类号 H05B33/10;H01L51/56 主分类号 H05B33/10
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