发明名称 |
System and Method for Replacing Resist Filter to Reduce Resist Filter-Induced Wafer Defects |
摘要 |
System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.
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申请公布号 |
US2008230492(A1) |
申请公布日期 |
2008.09.25 |
申请号 |
US20070688530 |
申请日期 |
2007.03.20 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
KAO YAO-HWAN;HUANG PO-CHANG |
分类号 |
B01D35/157 |
主分类号 |
B01D35/157 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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