发明名称 System and Method for Replacing Resist Filter to Reduce Resist Filter-Induced Wafer Defects
摘要 System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.
申请公布号 US2008230492(A1) 申请公布日期 2008.09.25
申请号 US20070688530 申请日期 2007.03.20
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 KAO YAO-HWAN;HUANG PO-CHANG
分类号 B01D35/157 主分类号 B01D35/157
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