| 发明名称 |
CONTACT STRUCTURE HAVING DIELECTRIC SPACER AND METHOD |
| 摘要 |
A contact structure and method of forming same are disclosed. The contact structure may include a metal body surrounded by a dielectric spacer, the metal body and the dielectric spacer positioned within an interlevel dielectric layer, wherein the metal body is electrically coupled to a silicide region below a lowermost portion of the metal body.
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| 申请公布号 |
US2008230906(A1) |
申请公布日期 |
2008.09.25 |
| 申请号 |
US20070689723 |
申请日期 |
2007.03.22 |
| 申请人 |
WONG KEITH KWONG HON;YANG CHIH-CHAO;YANG HAINING S |
发明人 |
WONG KEITH KWONG HON;YANG CHIH-CHAO;YANG HAINING S. |
| 分类号 |
H01L23/52;H01L21/44 |
主分类号 |
H01L23/52 |
| 代理机构 |
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代理人 |
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| 主权项 |
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