PLASMA SPECIES AND UNIFORMITY CONTROL THROUGH PULSED VHF OPERATION

摘要

An apparatus for controlling plasma species and plasma uniformity through a pulsed VHF(Very High Frequency) operation is provided to improve substrate treatment uniformity by maintaining process parameters in a process chamber constant. A process treating apparatus includes a chamber, a high frequency power source(116), and a low frequency power source(118). The chamber includes first and second electrodes allocated therein. The high frequency power source is electrically connected to one of the first and second electrodes and provides a first RF(Radio Frequency) signal to the connected electrode. The low frequency power source is connected to one of the first and second electrodes and provides a second RF signal to the connected electrode. A frequency range of the high frequency power source is arranged between 27 and 200 MHz. A duty cycle of a pulse lies between 1% and 100%.