发明名称 LASER PROCESSING FOR HEAT-SENSITIVE MESOSCALE DEPOSITION
摘要 A method of depositing various materials onto heat-sensitive targets. Heat-sensitive targets are generally defined as targets that have thermal damage thresholds that are lower than the temperature required to process a deposited material. The invention uses precursor solutions and/or particle or colloidal suspensions, along with optional pre-deposition treatment and/or post-deposition treatment to lower the laser power required to drive the deposit to its final state. The present invention uses Maskless Mesoscale Material Deposition (M<3>DTM) to perform direct deposition of material onto the target in a precise, highly localized fashion. Features with linewidths as small as 4 microns may be deposited, with little or no material waste. A laser is preferably used to heat the material to process it to obtain the desired state, for example by chemical decomposition, sintering, polymerization, and the like. This laser processing may be performed in an ambient environment with laser powers of less than 100 milliwatts.
申请公布号 EP1670610(A4) 申请公布日期 2008.09.10
申请号 EP20040789155 申请日期 2004.09.27
申请人 OPTOMEC DESIGN COMPANY 发明人 RENN, MICHAEL, J.;KING, BRUCE, H.;ESSIEN, MARCELINO;SHEU, JYH-CHEMG
分类号 B05D1/02;B05D1/12;B05D1/40;B05D3/00;B05D3/06;B05D5/12;B05D7/02;B23K;C08F2/46;C08J7/04;C08J7/18;C23C18/02;C23C18/14;G02B6/00;H01L51/00 主分类号 B05D1/02
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