发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device that stably operates at high temperatures, and to provide a manufacturing method therefor. SOLUTION: A transistor 1, the semiconductor device, comprises: an n<SP>+</SP>-SiC layer 40 composed of a silicon carbide; and a p<SP>-</SP>-diamond layer 50 composed of diamond that is formed on the n<SP>+</SP>-SiC layer 40 to constitute a heterojunction between the p<SP>-</SP>-diamond layer 50 and the n<SP>+</SP>-SiC layer. The p<SP>-</SP>-diamond layer 50 is formed with openings 99 for removing a region where the nucleus of the diamond that constitutes the p<SP>-</SP>-diamond layer 50 is generated. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008166584(A) 申请公布日期 2008.07.17
申请号 JP20060355797 申请日期 2006.12.28
申请人 SUMITOMO ELECTRIC IND LTD 发明人 CHIKUNO TAKASHI
分类号 H01L21/331;H01L21/205;H01L29/737 主分类号 H01L21/331
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