| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<p>A lithographic apparatus and a device manufacturing method are provided to reduce and prevent bubbles in an immersion liquid by reducing a gap size or an area on a substrate table and/or covering a gap. A lithographic projection apparatus includes a supporting table for holding a target. The target includes one or more elements of a sensor, a substrate, and a closing plate. A gap between the target and the supporting table is maintained to a minimum in order to minimize the generation of bubbles in liquid. The gap between the target and the supporting table is less than 0.8mm. The supporting table is configured to hold a cover plate.</p> |
| 申请公布号 |
KR20080066645(A) |
申请公布日期 |
2008.07.16 |
| 申请号 |
KR20080060253 |
申请日期 |
2008.06.25 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JANSEN HANS;CORNELISSEN SEBASTIAAN MARIA JOHANNES;DONDERS SJOERD NICOLAAS LAMBERTUS;DE GRAAF ROELOF FREDERIK;HOOGENDAM CHRISTIAAN ALEXANDER;JACOBS HERNES;LEENDERS MARTINUS HENDRIKUS ANTONIUS;MERTENS JEROEN JOHANNES SOPHIA MARIA;STREEFKERK BOB;VAN DER TOORN JAN GERARD CORNELIS;SMITS PETER;JANSSEN FRANCISCUS JOHANNES JOSEPH;RIEPEN MICHEL |
| 分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
| 代理机构 |
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