发明名称 METHOD OF MANUFACTURING THIN FILM DEVICE, ELECTRO-OPTIC DEVICE, AND ELECTRONIC INSTRUMENT
摘要 A method of manufacturing a thin film device includes: manufacturing a multi-layered structure in which a transfer layer including a thin film device is transferred to a first surface of the transfer-target substrate; and adhering a second surface of the transfer-target substrate, to which the transfer layer was transferred, to the other substrate provided with a thin film device while the second surface faces the other substrate.
申请公布号 US2008096329(A1) 申请公布日期 2008.04.24
申请号 US20070953961 申请日期 2007.12.11
申请人 SEIKO EPSON CORPORATION 发明人 KODAIRA TAIMEI
分类号 H01L21/84 主分类号 H01L21/84
代理机构 代理人
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