| 摘要 |
<p>PURPOSE: A cap metal forming method is provided to supply a cap metal having a uniform membrane thickness, and to reduce the used amount of an electroless plating solution by restricting production of by-products. CONSTITUTION: A cap metal forming method includes the following steps: horizontally maintaining a substrate on a rotatable maintenance device built in an inner chamber(120); supplying gas into the inner chamber and an outer chamber(110); forming pressure gradient between the inner chamber and the outer chamber; supplying plating liquid on the predetermined location of the surface of the substrate; and forming the cap metal at least one or more regions.</p> |
