APPARATUS FOR CLEANING A SUBSTRATE

摘要

PURPOSE: A substrate cleaning apparatus is provided to uniformly remove impurities on a substrate by preventing a shaft from being bent and uniformly contacting a brush unit on a substrate. CONSTITUTION: A substrate cleaning apparatus comprises a cleaning chamber, a brush unit(120), and a driving part. The cleaning chamber forms a substrate cleaning space. The brush unit has a shaft(121), one or more bending prevention members(123), and a brush(125). The shaft is fixed and coupled with the both side walls of the cleaning chamber. One or more bending prevention members are placed inside the shaft. The bending prevention members prevent the shaft from being bent. The brush covers the outside of the shaft. The brush contacts the substrate. The drive part is mechanically connected to the shaft.