发明名称 EXPOSURE DEVICE AND DEVICE PRODUCING METHOD
摘要 <p>A wafer (W) and a table (TB) having the wafer (W) placed thereon are held between a water pressure pad (32) and a water pressure pad (34). The distance in the direction of the optical axis of a projection optics system (PL) between a bearing surface and the wafer (W) is maintained at a predetermined value by the water pressure pad (32). Further, since the water pressure pads, unlike static gas pressure bearings, utilize the hydrostatic pressure of non-compressive fluid (liquid) between a bearing surface and a support object (substrate), the bearing rigidity is high and the distance between the bearing surface and the substrate is stabilized and held constant. Further, liquid (e.g., pure water) is higher in viscosity than gas (e.g., air) and is superior in vibration damping to gas. Therefore, transfer of patterns onto an almost defocus-free wafer (substrate) can be realized without necessarily having to provide a focal position detecting system or the like.</p>
申请公布号 KR20100024488(A) 申请公布日期 2010.03.05
申请号 KR20107000875 申请日期 2004.06.18
申请人 NIKON CORPORATION 发明人 EBIHARA AKIMITSU
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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