发明名称 LIQUID RECOVERY SYSTEM, IMMERSION EXPOSURE APPARATUS, IMMERSION EXPOSING METHOD, AND DEVICE FABRICATING METHOD
摘要 <p>A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system is provided with a first opening; a gap portion that is provided so that a liquid on an object that opposes the first opening can flow into the gap portion through the first opening; a liquid recovery part that suctions, through a porous member, at least part of the liquid that flows into the gap portion; and a second opening that is different from the first opening. The gap portion is open to the atmosphere through the second opening.</p>
申请公布号 EP2106574(A2) 申请公布日期 2009.10.07
申请号 EP20080704110 申请日期 2008.01.23
申请人 NIKON CORPORATION 发明人 NAGASAKA, HIROYUKI
分类号 G03F7/20 主分类号 G03F7/20
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