| 摘要 |
PURPOSE: A plasma generator system and a method for forming the plasma are provided to reduce the sputtering and ion impact of the system component. CONSTITUTION: A plasma generator system(100) includes a container(104), a single coil(108), an energy source(110), and a capacitor(158). The single coil is arranged around the container. The single coil includes a first end(136), a second end(138), a first winding(140) and a second winding(142). The energy source is directly connected to the first end. The capacitor is directly connected to the second end. The first winding is extended from the first end. The second winding is integrated with the first winding and is extended to the second end. |
