| 发明名称 |
Dry etching method for magnetic material |
| 摘要 |
A dry etching method in which a plasma of an etching gas is generated and a magnetic material is dry-etched using a mask material made of a non-organic material, the method being characterized in that the etching gas is selected from (i) a ketone of formula RCOR', wherein R and R' are an alkyl group, and (ii) a lower non-substituted hydrocarbon. |
| 申请公布号 |
EP2184380(A1) |
申请公布日期 |
2010.05.12 |
| 申请号 |
EP20100001013 |
申请日期 |
2004.07.26 |
| 申请人 |
CANON ANELVA CORPORATION |
发明人 |
KODAIRA, YOSHIMITSU;HIROMI, TAICHI |
| 分类号 |
C23F4/00;G11B5/31;G11C11/16;H01F1/14;H01F1/34;H01F41/30;H01L21/3065;H01L21/3213;H01L43/08;H01L43/12 |
主分类号 |
C23F4/00 |
| 代理机构 |
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